STRESS IN THICK SOL-GEL PHOSPHOSILICATE GLASS-FILMS FORMED ON SI SUBSTRATES

Authors
SYMS RRA
Citation
Rra. Syms, STRESS IN THICK SOL-GEL PHOSPHOSILICATE GLASS-FILMS FORMED ON SI SUBSTRATES, Journal of non-crystalline solids, 167(1-2), 1994, pp. 16-20
Citations number
14
Categorie Soggetti
Material Science, Ceramics
Journal title
Journal of non-crystalline solids → ACNP
ISSN journal
00223093
Volume
167
Issue
1-2
Year of publication
1994
Pages
16 - 20
Database
ISI
SICI code
0022-3093(1994)167:1-2<16:SITSPG>2.0.ZU;2-K
Abstract
It is shown that thick (> 10 mum) films of phosphosilicate glass may b e formed on silicon substrates by repetitive spin-coating and rapid th ermal annealing of commercial sol-gel material. The viability of the p rocess is explained in terms of film stresses, and it is demonstrated that annealing above a critical temperature is necessary to prevent st ress failure.