PREPARATION OF A WELL-ORDERED ALUMINUM-OXIDE LAYER ON NIAL(001)

Citation
P. Gassmann et al., PREPARATION OF A WELL-ORDERED ALUMINUM-OXIDE LAYER ON NIAL(001), Journal of electron spectroscopy and related phenomena, 64-5, 1993, pp. 315-320
Citations number
25
Categorie Soggetti
Spectroscopy
ISSN journal
03682048
Volume
64-5
Year of publication
1993
Pages
315 - 320
Database
ISI
SICI code
0368-2048(1993)64-5:<315:POAWAL>2.0.ZU;2-F
Abstract
The formation of a well ordered aluminum oxide layer on NiAl(001) has been studied by means of high resolution electron energy loss spectros copy (EELS), low energy electron diffraction (LEED) and Auger electron spectroscopy (AES). A thin aluminum oxide film is produced by anneali ng the oxygen saturated surface to 1200 K. The distinct (2x1) LEED pat tern produced by the film shows that it is well ordered and commensura te with the substrate. The EEL spectrum exhibits four loss peaks at 42 0 cm(-1), 603 cm(-1), 718 cm(-1) and 896 cm(-1). The lattice structure of the theta modification of Al2O3 matches both the LEED pattern and the EEL spectrum. The EEL spectrum can be reproduced by calculations b ased on the dielectric theory. From this the thickness of the oxide fi lm is estimated to be about 10 Angstrom. A structure model for the the ta-Al2O3/NiAl(001) system is given.