PHOTOOXIDATION OF SULFENIC ACID-DERIVATIVES .1. SULFENAMIDES - THE SURPRISING BEHAVIOR OF A NEW CLASS OF PHOTOOXIDATION SUBSTRATES

Authors
CLENNAN EL ZHANG HW
Citation
El. Clennan et Hw. Zhang, PHOTOOXIDATION OF SULFENIC ACID-DERIVATIVES .1. SULFENAMIDES - THE SURPRISING BEHAVIOR OF A NEW CLASS OF PHOTOOXIDATION SUBSTRATES, Journal of the American Chemical Society, 116(2), 1994, pp. 809-810
Citations number
20
Categorie Soggetti
Chemistry
Journal title
Journal of the American Chemical Society → ACNP
ISSN journal
00027863
Volume
116
Issue
2
Year of publication
1994
Pages
809 - 810
Database
ISI
SICI code
0002-7863(1994)116:2<809:POSA.S>2.0.ZU;2-5