IN-SITU GROWTH OF SUPERCONDUCTING OXIDE THIN-FILMS BY HOT-WALL SPUTTERING METHOD

Authors
Citation
Rj. Lin et Lj. Chen, IN-SITU GROWTH OF SUPERCONDUCTING OXIDE THIN-FILMS BY HOT-WALL SPUTTERING METHOD, Zhongguo wuli xuekan, 31(6), 1993, pp. 1097-1102
Citations number
5
Categorie Soggetti
Physics
Journal title
ISSN journal
05779073
Volume
31
Issue
6
Year of publication
1993
Part
2
Pages
1097 - 1102
Database
ISI
SICI code
0577-9073(1993)31:6<1097:IGOSOT>2.0.ZU;2-O
Abstract
A simple, economic hot-wall DC sputtering system, which a deposition c hamber was made of a quartz tube and heated by a tube-furnace was used to grow as-deposited superconducting YBaCuO films on (001) MgO, (001) YSZ, (001) LaAlO3, and (1012BAR) Al2O3 (with YSZ buffer layer) and Bi SrCaCuO films on (001) MgO substrates. The films have strongly c-axis preferred orientation. The typical superconducting properties of the Y BaCuO and BiSrCaCuO films are T(c) (R = 0) of 90 K, J(c) of 3 x 10(6) A/CM2 at 77 K and T(c) (R = 0) of 79 K, J(c) of 2 x 10(4) A/CM2 at 4.2 K, respectively.