EFFECT OF THE DEPOSITION VARIABLES ON AMORPHOUS-SILICON STABILITY

Authors
BUITRAGO RH ARCE RD KOROPECKI RR
Citation
Rh. Buitrago et al., EFFECT OF THE DEPOSITION VARIABLES ON AMORPHOUS-SILICON STABILITY, Journal of non-crystalline solids, 166, 1993, pp. 259-262
Citations number
15
Categorie Soggetti
Material Science, Ceramics
Journal title
Journal of non-crystalline solids → ACNP
ISSN journal
00223093
Volume
166
Year of publication
1993
Part
1
Pages
259 - 262
Database
ISI
SICI code
0022-3093(1993)166:<259:EOTDVO>2.0.ZU;2-U
Abstract
The influence of R.F. frequency and Hydrogen dilution in the PECVD of a-Si:H has been studied. Results are expressed in terms of Staebler-Wr onki susceptibility.