TRANSPORT NEAR THE MOBILITY EDGE, THE SIGN OF THE HALL-EFFECT, PHOTOREDUCTION AND OXIDATION OF AMORPHOUS INO-CHI

Citation
B. Pashmakov et al., TRANSPORT NEAR THE MOBILITY EDGE, THE SIGN OF THE HALL-EFFECT, PHOTOREDUCTION AND OXIDATION OF AMORPHOUS INO-CHI, Journal of non-crystalline solids, 166, 1993, pp. 441-444
Citations number
8
Categorie Soggetti
Material Science, Ceramics
ISSN journal
00223093
Volume
166
Year of publication
1993
Part
1
Pages
441 - 444
Database
ISI
SICI code
0022-3093(1993)166:<441:TNTMET>2.0.ZU;2-2
Abstract
The electronic transport properties of amorphous indium oxide (a-InOx) are studied as samples are changed reversibly between semiconducting and metallic states by photoreduction and reoxidation. Photons with hv greater than or equal to 3.5eV produce conducting states in which hol es are self-trapped presumably in weak O-O bonds. Screening induces a nonmetal-metal transition at high electron concentrations n, while at lower n the temperature dependence of the conductivity follows the Mey er-Neldel rule with parameters nearly identical to hydrogenated amorph ous silicon. The normal sign and magnitude of the Hall effect may be d ue to the strongly ionic character of the bonding.