EXPERIMENTAL DARK DISCHARGE OF A-SI1-CHI-C-CHI-H FILMS AND ITS COMPARISON TO MONTE-CARLO SIMULATIONS

Citation
Racmm. Vanswaaij et al., EXPERIMENTAL DARK DISCHARGE OF A-SI1-CHI-C-CHI-H FILMS AND ITS COMPARISON TO MONTE-CARLO SIMULATIONS, Journal of non-crystalline solids, 166, 1993, pp. 533-536
Citations number
7
Categorie Soggetti
Material Science, Ceramics
ISSN journal
00223093
Volume
166
Year of publication
1993
Part
1
Pages
533 - 536
Database
ISI
SICI code
0022-3093(1993)166:<533:EDDOAF>2.0.ZU;2-T
Abstract
Dark discharge curves of a-Si1-xCx:H films of varying thickness have b een analyzed by comparing them to results of Monte Carlo simulations. In the simulations charge carrier transport was governed by the self i nduced field and a rectangular defect state distribution in the band g ap. Results indicate that the discharge is determined by surface charg e injection at the beginning of the discharge. However, at longer time s bulk generation becomes increasingly important.