M. Tanaka et al., EPITAXIAL COAL ALAS/GAAS METAL-SEMICONDUCTOR HETEROSTRUCTURES - GROWTH, STRUCTURE, AND ELECTRICAL-PROPERTIES/, Journal of applied physics, 75(2), 1994, pp. 885-896
Molecular beam epitaxial (MBE) growth, structural, and electrical prop
erties of novel epitaxial metal/semiconductor heterostructures (MSHs),
consisting of monocrystalline CoAl, an intermetallic compound, and Al
As/GaAs III-V semiconductors have been studied. The CoAl with stoichio
metric composition has a CsCl-type crystal structure whose lattice con
stant is very close to half the lattice constant of GaAs and AlAs, hen
ce, it is a good candidate as a constituent metal in epitaxial monocry
stalline metal/semiconductor heterostructures; MBE growth of CoAl thin
films on AlAs/GaAs, and also semiconductor overgrowth on ultrathin Co
Al films, together with structural characterizations by in situ reflec
tion high energy electron diffractions, ex situ x-ray diffractions and
cross sectional transmission electron microscopy have been explored.
By optimizing the growth parameters and procedures, high quality monoc
rystalline CoAl/AlAs/ GaAs heterostructures with atomically abrupt int
erfaces have been successfully grown. Furthermore, the electrical prop
erties of such novel heterostructures as Schottky barrier heights of C
oAl/AlAs/GaAs MSHs and transport properties in ultrathin buried CoAl f
ilms are described.