Multilayers of a-Si:N/a-SiN:H and a-Si:H/a-SiC:H were investigated by
contactless transient photoconductivity measurements. A faster decay o
f the photoconductivity was observed in the a-Si:H/a-SiC:H multilayer
whereas the a-Si:H/a-SiN:H multilayer was characterized by a slower de
cay relative to a pure a-Si:K Film. These effects are ascribed to defe
cts associated with interface states. The electron mobility in the thi
n a-Si:H layers of the multilayers does not appear to be appreciably d
ifferent from that in pure a-Si:H films.