Measurements using photothermal deflection spectroscopy (PDS) have bee
n performed on samples of amorphous gallium arsenide (a-GaAs) deposite
d by rf sputtering. Small quantities of hydrogen (p(H2)=1% P-Ar) induc
e changes of the Urbach energy, E(0). This quantity has a linear relat
ion with the Tauc optical gap, E(g). The behaviour of E(0) shows a dec
rease as a function of the quantity (W/p)(1/2), where W is the dischar
ge power and p the pressure in the deposition chamber. E(g) increases
with the hydrogen pressure and tends to saturate when p(H2) is greater
than 0.1 Pa. E(0) shows exactly the opposite trend. These results are
related to structural and morphological data obtained by TEM and THEE
D measurements.