STUDIES OF OPTICAL-ABSORPTION COEFFICIENTS-ALPHA OF A-SI-H BY PHOTOLUMINESCENCE ABSORPTION-SPECTROSCOPY

Authors
NITTA S NISHIMURA E MINAMIDE T UCHIDA T NONOMURA S
Citation
S. Nitta et al., STUDIES OF OPTICAL-ABSORPTION COEFFICIENTS-ALPHA OF A-SI-H BY PHOTOLUMINESCENCE ABSORPTION-SPECTROSCOPY, Journal of non-crystalline solids, 166, 1993, pp. 913-916
Citations number
7
Categorie Soggetti
Material Science, Ceramics
Journal title
Journal of non-crystalline solids → ACNP
ISSN journal
00223093
Volume
166
Year of publication
1993
Part
2
Pages
913 - 916
Database
ISI
SICI code
0022-3093(1993)166:<913:SOOCOA>2.0.ZU;2-A
Abstract
The limit of the film thickness that could be measured by optical abso rption coefficients alpha by photoluminescence absorption spectroscopy (PLAS) is studied and found to be about 400 to 500 Angstrom for prese nt experimental conditions. Points at issue to improve the limit to th inner films are discussed by using simulations. Results of preliminary experiments on the effect of the applied electric field to PLAS devic es are discussed.