ANNEALING STUDIES OF THE MICROCRYSTALLINE SILICON SYSTEM

Authors
HAPKE P FINGER F CARIUS R WAGNER H PRASAD K FLUCKIGER R
Citation
P. Hapke et al., ANNEALING STUDIES OF THE MICROCRYSTALLINE SILICON SYSTEM, Journal of non-crystalline solids, 166, 1993, pp. 981-984
Citations number
9
Categorie Soggetti
Material Science, Ceramics
Journal title
Journal of non-crystalline solids → ACNP
ISSN journal
00223093
Volume
166
Year of publication
1993
Part
2
Pages
981 - 984
Database
ISI
SICI code
0022-3093(1993)166:<981:ASOTMS>2.0.ZU;2-5
Abstract
Annealing studies on intrinsic and doped microcrystalline silicon prep ared with low temperature PECVD reveal the significance of percolation processes in this material. Electrical transport and optical spectros copy are used to investigate the effects of annealing on the structure and the transport properties of the material.