THERMAL EVOLUTION AND STABILITY OF A TIN NITRIDE OBTAINED BY REACTIVESPUTTERING

Authors
LIMA RS DIONISIO PH MORO JT SCHREINER WH ACHETE C
Citation
Rs. Lima et al., THERMAL EVOLUTION AND STABILITY OF A TIN NITRIDE OBTAINED BY REACTIVESPUTTERING, Hyperfine interactions, 83(1-4), 1994, pp. 315-319
Citations number
2
Categorie Soggetti
Physics, Atomic, Molecular & Chemical","Physics, Nuclear","Physics, Condensed Matter
Journal title
Hyperfine interactions → ACNP
ISSN journal
03043843
Volume
83
Issue
1-4
Year of publication
1994
Pages
315 - 319
Database
ISI
SICI code
0304-3843(1994)83:1-4<315:TEASOA>2.0.ZU;2-0
Abstract
Tin nitride obtained by reactive magnetron sputtering was annealed at several temperatures to study the thermal evolution and stability of t he compound. X-ray diffraction, thermal effusion and conversion electr on Mossbauer spectrometry were used to characterize the events. The ni tride has different stabilities, depending on the ambient conditions u nder which the annealings are performed. Apparently only one crystallo graphic phase of the nitride is present before it disproportionates.