MECHANISM OF ANOMALOUS MIGRATION OF IMPLANTED IMPURITIES

Known approaches to the mechanisms of anomalous defect formation and d eep penetration of implanted impurities into materials are analyzed. T he most adequate for explaining the anomalously rapid diffusion is bel ieved to be the mechanism involving the acceleration of migration as a result of mechanical stress gradients created around the implanted la yer. On the basis of this assumption a model estimate is made of the a dditional depth of penetration of an implanted impurity. The results o f the study confirm unambiguously that the mechanical stress gradients increase the rate of migration of impurities implanted into solids.