ACCELERATED VAPOR GROWTH CAUSED BY ROUGHENING TRANSITIONS IN THE VICINAL AREAS OF RH(111) AND RH(110)

Authors
Citation
R. Vanselow et Xqd. Li, ACCELERATED VAPOR GROWTH CAUSED BY ROUGHENING TRANSITIONS IN THE VICINAL AREAS OF RH(111) AND RH(110), Surface science, 301(1-3), 1994, pp. 120000229-120000234
Citations number
10
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
301
Issue
1-3
Year of publication
1994
Pages
120000229 - 120000234
Database
ISI
SICI code
0039-6028(1994)301:1-3<120000229:AVGCBR>2.0.ZU;2-V
Abstract
Vapour growth as a function of sample temperature was studied with FEM in the clean vicinal areas of Rh{lll) and Rh{11O}. A fairly steady gr owth was observed up to about 700 K: Classical growth at T<T-c (T-c=ro ughening transition temperature). The growth rate increased steeply at 720 K along the [211]) edges of {111} and at 680 K along the [100] ed ges of {110}: Accelerated growth at T>T-c.(T-c({110}/[211])=720 K;T-c( {110}/[100])=680 K.) (A roughening of the {110} face itself could not be observed.) The rapid growth at T greater than or equal to T-c is in agreement with a prediction by Burton and Cabrera (1949).