XPS STUDY OF THE A-C-H AL2O3 INTERFACE

The interface between diamond-like amorphous hydrogenated carbon (a-C: H) and Al2O3 was analysed by sputter depth profile analysis via x-ray photoelectron spectroscopy. X-ray photoelectron spectra were also reco rded during direct ion beam deposition (CH4, E = 400 eV) monitoring th e initial build-up of the interface. No stoichiometric interface compo und was detected, although Al2O3 is reduced to Al2O3-x (x similar to 0 .5-1) enabling an interaction with the carbon atoms. This results in a n excellent adhesion of a-C:H to the chemically inert Al2O3.