DEPOSITION RATE OF AG ON NACL SUBSTRATE IN HIGH-TEMPERATURE AR GAS OFLOW CONCENTRATION

Deposition rates of Ag thin films on NaCl substrates in Ar gas (900 K, 1.0 Pa) are calculated on a couple of conditions of Ag flow from an e vaporation source (evaporation rate: 1.0 mg/s, source-to-substrate dis tance: 90 mm). In case of radial flow from the source, the Ag depositi on rate is estimated to be 3.7 nm/s on the substrate fixed on a plate of wide plane surface. Another rate of 0.1 nm/s is obtained on the sub strate fixed in a cylindrical box. The results suggest that there exis t Ag flux concentrations in regions near these substrates.