SOFT-X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF THE INTERACTION OF CR WITH MOS2(0001)

The interaction of Cr with the MoS2(0001) surface was studied with cor e-level and valence-band soft X-ray photoelectron spectroscopy employi ng synchrotron radiation (hnu = 150-400 eV). Cr vapor-deposited at roo m temperature formed relatively flat films on MoS2(0001). The Cr under went a limited chemical reaction with the MoS2 substrate to form a chr omium sulfide and Mo metal. The Mo metal formed a thin layer between t he Cr film and the MoS2 substrate. In contrast, reacted S was incorpor ated throughout the Cr film, with its concentration enhanced at the su rface. Annealing the Cr-covered sample drove the reaction between Cr a nd MoS2, forming additional Mo metal that alloyed with Cr, and several adsorbed S species on the Cr film surface. Annealing also caused part ial coalescence of the Cr-containing portion of the film, uncovering p arts of the Cr-Mo alloy. The reactivity of Cr with respect to MoS2(000 1) is greater than that of Fe and somewhat less than that of Mn.