X-RAY-DIFFRACTION FROM ANODIC TIO2 FILMS - IN-SITU AND EX-SITU COMPARISON OF THE TI(0001) FACE

Citation
Dg. Wiesler et al., X-RAY-DIFFRACTION FROM ANODIC TIO2 FILMS - IN-SITU AND EX-SITU COMPARISON OF THE TI(0001) FACE, Surface science, 302(3), 1994, pp. 341-349
Citations number
20
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
302
Issue
3
Year of publication
1994
Pages
341 - 349
Database
ISI
SICI code
0039-6028(1994)302:3<341:XFATF->2.0.ZU;2-M
Abstract
X-ray diffraction with synchrotron radiation is used to study the stru cture and epitaxy of a thin (approximately 250 angstrom) anodic film g rown slowly on the basal plane of single-crystal Ti. Anatase crystalli tes, roughly 130 angstrom in diameter, am observed, with no indication of other forms of TiO2 or films with lower oxidation state. The oxide is more orientationally disordered than films grown on the (1120BAR) and (1010BAR) faces of Ti, but it exhibits weak six- and twelve-fold t exturing by the metal sublayer. In situ and ex situ measurements are q ualitatively similar, suggesting that the oxide does not change apprec iably upon emersion.