Dg. Wiesler et al., X-RAY-DIFFRACTION FROM ANODIC TIO2 FILMS - IN-SITU AND EX-SITU COMPARISON OF THE TI(0001) FACE, Surface science, 302(3), 1994, pp. 341-349
X-ray diffraction with synchrotron radiation is used to study the stru
cture and epitaxy of a thin (approximately 250 angstrom) anodic film g
rown slowly on the basal plane of single-crystal Ti. Anatase crystalli
tes, roughly 130 angstrom in diameter, am observed, with no indication
of other forms of TiO2 or films with lower oxidation state. The oxide
is more orientationally disordered than films grown on the (1120BAR)
and (1010BAR) faces of Ti, but it exhibits weak six- and twelve-fold t
exturing by the metal sublayer. In situ and ex situ measurements are q
ualitatively similar, suggesting that the oxide does not change apprec
iably upon emersion.