R. Hayase et al., POSITIVE PHOTOSENSITIVE POLYIMIDES USING POLYAMIC ACID-ESTERS WITH PHENOL MOIETIES, Journal of applied polymer science, 51(11), 1994, pp. 1971-1978
Polyimide resists developable with basic aqueous solutions were realiz
ed by polyamic acid esters with phenol moieties (PPh's) and naphthoqui
none diazides. The polyimide precursors (PPh's) were synthesized from
diamines and dicarboxylic acids that have phenol moieties through este
r linkage. A selective reaction of alcohol groups with acid dianhydrid
e groups made the synthesis of the PPh's possible, even if the phenol
groups were in the reaction mixtures. The PPh's were soluble in basic
aqueous developer, but their dissolution rates were too low for use as
resists. To increase the resist dissolution rate, polyamic acids were
added to the PPh's. By adjusting the dissolution rates in basic aqueo
us developers, fine patterns could be realized. The polyimide resists
had high thermal stability and reliable adhesive property to silicon s
ubstrate. (C) 1994 John Wiley & Sons, Inc.