FABRICATION OF 0.1 MU-M LINE-AND-SPACE PATTERNS USING SOFT-X-RAY REDUCTION LITHOGRAPHY

Soft X-ray projection lithography with a reduction rate of 32 was exam ined using Mo/Si-multilayer-coated Schwarzschild optics. The optics we re designed to function at 13 nm, and were aligned with the synchrotro n radiation light source. The patterns on a transmission mask were ima ged in a 0.18-mu m-thick polymethyl methacrylate resist. Line-and-spac e patterns down to 0.1 mu m were fabricated.