NOVEL SUPERRESOLUTION TECHNIQUE FOR OPTICAL LITHOGRAPHY - NONLINEAR MULTIPLE EXPOSURE METHOD

Authors
OOKI H KOMATSU M SHIBUYA M
Citation
H. Ooki et al., NOVEL SUPERRESOLUTION TECHNIQUE FOR OPTICAL LITHOGRAPHY - NONLINEAR MULTIPLE EXPOSURE METHOD, JPN J A P 2, 33(2A), 1994, pp. 120000177-120000179
Citations number
6
Categorie Soggetti
Physics, Applied
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS → ACNP
Volume
33
Issue
2A
Year of publication
1994
Pages
120000177 - 120000179
Database
ISI
SICI code
Abstract
A novel method for optical lithography using a resist with nonlinear p hotosensitivity and the multiple exposure technique is described. By m eans of this method, the diffraction-limited optical cutoff frequency is raised markedly, which cannot be realized by any of the other metho ds proposed previously. A brief explanation of the principle is given and computer simulations are demonstrated.