Laser ablation has become a widely recognized tool for materials proce
ssing. In the area of polymeric materials, applications of UV lasers f
or surface modification, microlithography, cutting, and boring have be
en explored. With the addition of dopants into the bulk, it has become
possible to sensitize most known classes of polymers for UV laser abl
ation at any desired wavelength, including fluoropolymers. Important f
eatures of dopant-induced ablation are the reduction of threshold ener
gy fluence required for ablation, and the enhancement of the etching r
ate by factors higher than ten. In the present review the investigated
dopant/polymer systems are summarized and compared. Based on the avai
lable information, a general scheme including all relevant pathways is
suggested, revealing that in each particular case the dominant mechan
ism depends on the specific system under study.