ON-CHIP P-MOSFET DOSIMETRY

Citation
Mg. Buehler et al., ON-CHIP P-MOSFET DOSIMETRY, IEEE transactions on nuclear science, 40(6), 1993, pp. 1442-1449
Citations number
9
Categorie Soggetti
Nuclear Sciences & Tecnology","Engineering, Eletrical & Electronic
ISSN journal
00189499
Volume
40
Issue
6
Year of publication
1993
Part
1
Pages
1442 - 1449
Database
ISI
SICI code
0018-9499(1993)40:6<1442:OPD>2.0.ZU;2-7
Abstract
On-chip p-FETs were developed to monitor the radiation dose of n-well CMOS ICs by monitoring threshold voltage shifts due to radiation induc ed oxide and interface charge. The design employs closed geometry FETs and a zero-biased n-well to eliminate leakage currents. The FETs are operated using a constant current chosen to greatly reduce the FET's t emperature sensitivity. The dose sensitivity of these p-FETs is about -2.6 mV/krad(Si) and the off-chip instrumentation resolves about 400 r ad(Si)/bit. When operated with a current at the temperature-independen t point, it was discovered that the pre-irradiation output voltage is about -1.5 V which depends only on design-independent silicon material parameters. The temperature sensitivity is less than 63 mu V/degrees C over a 70 degrees C temperature range centered about the temperature insensitive point.