X-RAY PHOTOELECTRON-SPECTROSCOPY ANALYSIS OF POLYIMIDE FILMS MODIFIEDBY ULTRAVIOLET PULSED-LASER RADIATION AT 193 NM

Authors
Citation
A. Brezini et N. Zekri, X-RAY PHOTOELECTRON-SPECTROSCOPY ANALYSIS OF POLYIMIDE FILMS MODIFIEDBY ULTRAVIOLET PULSED-LASER RADIATION AT 193 NM, Journal of applied physics, 75(4), 1994, pp. 2015-2019
Citations number
21
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
75
Issue
4
Year of publication
1994
Pages
2015 - 2019
Database
ISI
SICI code
0021-8979(1994)75:4<2015:XPAOPF>2.0.ZU;2-6
Abstract
Polyimide films were treated in air with an argon-fluorine ultraviolet excimer laser (lambda = 193 nm). X-rav photoelectron spectroscopy ana lysis was performed on the modified surfaces after laser exposure at v arious fluences around the expected threshold fluence F(th). From the present data the photochemical process (photoablation) leads to produc e a carbon-rich surface by ejecting mainly oxides of carbon and nitrog en compounds above a particular fluence F(e).