A. Brezini et N. Zekri, X-RAY PHOTOELECTRON-SPECTROSCOPY ANALYSIS OF POLYIMIDE FILMS MODIFIEDBY ULTRAVIOLET PULSED-LASER RADIATION AT 193 NM, Journal of applied physics, 75(4), 1994, pp. 2015-2019
Polyimide films were treated in air with an argon-fluorine ultraviolet
excimer laser (lambda = 193 nm). X-rav photoelectron spectroscopy ana
lysis was performed on the modified surfaces after laser exposure at v
arious fluences around the expected threshold fluence F(th). From the
present data the photochemical process (photoablation) leads to produc
e a carbon-rich surface by ejecting mainly oxides of carbon and nitrog
en compounds above a particular fluence F(e).