Rg. Buchheit et al., ELECTROCHEMICAL-BEHAVIOR OF THE T-1 (AL2CULI) INTERMETALLIC COMPOUND AND ITS ROLE IN LOCALIZED CORROSION OF AL-2-PERCENT-LI-3-PERCENT-CU ALLOYS, Corrosion, 50(2), 1994, pp. 120-130
The T-1(AI(2)CuLi) intermetallic compound was synthesized in bulk form
for characterization of its electrochemical behavior in chloride solu
tions by conventional direct current (DC) techniques. Results indicate
d T-1 was active with respect to its microstructural suroundings in ar
tificially aged Aluminum Association (AA) 2090 (UNS A92090) (Al 2.1% L
i-2.6% Cu) and preferential dissolution of T-1 precipitates strongly i
nfluenced localized corrosion behavior of the alloy. Subgrain boundari
es in artificially aged AA 2090 were particularly susceptible to local
ized attack because of high concentrations of T-1. The role of T-1 in
preferential subgrain boundary attack in a chloride-free sulfate solut
ion also was investigated.