N-IMPLANTATION INDUCED ENHANCED ADHESION OF AMORPHOUS-SIC FILMS DEPOSITED ON STAINLESS-STEEL()

Authors
LAIDANI N MIOTELLO A GUZMAN L CALLIARI L
Citation
N. Laidani et al., N-IMPLANTATION INDUCED ENHANCED ADHESION OF AMORPHOUS-SIC FILMS DEPOSITED ON STAINLESS-STEEL(), Applied physics letters, 64(8), 1994, pp. 977-979
Citations number
16
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
64
Issue
8
Year of publication
1994
Pages
977 - 979
Database
ISI
SICI code
0003-6951(1994)64:8<977:NIEAOA>2.0.ZU;2-I
Abstract
Amorphous a-SiC films were deposited by rf magnetron sputtering on sta inless steel and N+ implantations were performed at room temperature o ver a fluence range of 1X10(16)-1X10(17) ions/cm2 at 30 and 160 keV Ch emical characterization of the a-SiC/steel interface and compositional depth profiles were obtained by Auger electron spectroscopy. Adhesion properties of the films were examined using a scratch tester in conju nction with scanning electron microscopy. A strong adhesion enhancemen t (about a factor of eight) along with an improvement of the fracture toughness were observed in the implanted a-SiC/steel specimens. The ke y mechanisms envisaged to explain the enhanced adhesion is mainly rela ted to the new chemical bondings, involving C and N in Si-(N,C)-Cr com plexes formation at the a-SiC/steel interface.