ON THE CORRELATION AMONG PHOTODEGRADATION, CHARGED DANGLING BONDS ANDMICROSTRUCTURE IN HYDROGENATED AMORPHOUS-SILICON

Authors
Citation
F. Irrera, ON THE CORRELATION AMONG PHOTODEGRADATION, CHARGED DANGLING BONDS ANDMICROSTRUCTURE IN HYDROGENATED AMORPHOUS-SILICON, Journal of applied physics, 75(3), 1994, pp. 1396-1400
Citations number
20
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
75
Issue
3
Year of publication
1994
Pages
1396 - 1400
Database
ISI
SICI code
0021-8979(1994)75:3<1396:OTCAPC>2.0.ZU;2-U
Abstract
We propose that in hydrogenated amorphous silicon the mechanism of con version from charged to neutral dangling bonds adds to the weak Si-Si bond breaking during light soaking. Our model is developed from an equ ilibrium picture of the density of states as given by the defect pool theory [K. Winer, Phys. Rev. B 41, 150 (1990)] and predicts an increas e rate of the neutral dangling bonds density (D-0) proportional to (1/ D-0)(2), which is related either to the charged defect conversion prob ability and to the bond-breaking probability. This model explains phot oconductivity experiments and, in particular, the short-time features: it shows that the photodegradation is enhanced in clustered hydrogen- rich samples provided the density of charged dangling bonds is correla ted with the clustered hydrogen present in the amorphous network.