F. Irrera, ON THE CORRELATION AMONG PHOTODEGRADATION, CHARGED DANGLING BONDS ANDMICROSTRUCTURE IN HYDROGENATED AMORPHOUS-SILICON, Journal of applied physics, 75(3), 1994, pp. 1396-1400
We propose that in hydrogenated amorphous silicon the mechanism of con
version from charged to neutral dangling bonds adds to the weak Si-Si
bond breaking during light soaking. Our model is developed from an equ
ilibrium picture of the density of states as given by the defect pool
theory [K. Winer, Phys. Rev. B 41, 150 (1990)] and predicts an increas
e rate of the neutral dangling bonds density (D-0) proportional to (1/
D-0)(2), which is related either to the charged defect conversion prob
ability and to the bond-breaking probability. This model explains phot
oconductivity experiments and, in particular, the short-time features:
it shows that the photodegradation is enhanced in clustered hydrogen-
rich samples provided the density of charged dangling bonds is correla
ted with the clustered hydrogen present in the amorphous network.