Chemical vapor deposition (CVD) of palladium is at present not used co
mmercially, despite the widespread use of palladium films in electroni
cs and data storage, because suitable precursors are not available. Ne
w palladium precursors, allyl(beta-diketonato)palladium(II) complexes
(see Figure) are reported, along with the conditions required for the
formation of pure palladium films by CVD.