OPTICAL ANISOTROPY IN WIRE-GEOMETRY SIGE LAYERS GROWN BY GAS-SOURCE SELECTIVE EPITAXIAL-GROWTH TECHNIQUE

Citation
N. Usami et al., OPTICAL ANISOTROPY IN WIRE-GEOMETRY SIGE LAYERS GROWN BY GAS-SOURCE SELECTIVE EPITAXIAL-GROWTH TECHNIQUE, Applied physics letters, 64(9), 1994, pp. 1126-1128
Citations number
16
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
64
Issue
9
Year of publication
1994
Pages
1126 - 1128
Database
ISI
SICI code
0003-6951(1994)64:9<1126:OAIWSL>2.0.ZU;2-Q
Abstract
We report on the successful fabrication of SiGe quantum wire structure s on a V-groove patterned substrate by gas-source selective epitaxial growth technique, and their optical properties. Optical anisotropy, sh owing the realization of luminescent SiGe layers with wire geometry, w as clearly observed in electroluminescence from the SiGe layers grown inside the groove.