OPTICAL ANISOTROPY IN WIRE-GEOMETRY SIGE LAYERS GROWN BY GAS-SOURCE SELECTIVE EPITAXIAL-GROWTH TECHNIQUE
Citation
N. Usami et al., OPTICAL ANISOTROPY IN WIRE-GEOMETRY SIGE LAYERS GROWN BY GAS-SOURCE SELECTIVE EPITAXIAL-GROWTH TECHNIQUE, Applied physics letters, 64(9), 1994, pp. 1126-1128
Categorie Soggetti
Physics, Applied
SICI code
0003-6951(1994)64:9<1126:OAIWSL>2.0.ZU;2-Q
Abstract
We report on the successful fabrication of SiGe quantum wire structure
s on a V-groove patterned substrate by gas-source selective epitaxial
growth technique, and their optical properties. Optical anisotropy, sh
owing the realization of luminescent SiGe layers with wire geometry, w
as clearly observed in electroluminescence from the SiGe layers grown
inside the groove.