A thermooptic (TO) phase shifter consisting of a thin film heater on t
he top of a loaded stripline silica waveguide on a silicon substrate i
s shown to exhibit faster time response than reported for phase shifte
rs based on a buried silica waveguide configuration. The rise time was
measured to be 0.24 ms, which is in good agreement with calculated th
ermal distributions in the structures. The lateral heat diffusion dist
ance in the loaded stripline structure is shown to be smaller than in
buried waveguide structures. This implies small thermal crosstalk and
suggests a high-level integration of adjacent waveguides.