Sc. Choi et al., HETEROEPITAXIAL GROWTH OF Y2O3 FILMS ON SI(100) BY REACTIVE IONIZED CLUSTER BEAM DEPOSITION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 170-174
Heteroepitaxial Y2O3 films on Si(100) have been grown by the technique
of reactive ionized cluster beam (ICE) deposition. The composition of
deposited film is investigated by using the X-ray photoelectron spect
roscopy (XPS). It was found that the composition ratio of Y to O is 1
to 1.46. Using reflection high energy electron diffraction (RHEED) and
glancing angle X-ray diffraction (GXRD), we study the crystallinity o
f the films. It was noticed that the orientation of deposited film is
mainly determined by the substrate temperature and the cluster acceler
ation energy. We also found that, without acceleration below 800 degre
es C, Y2O3 films were grown as polycrystalline. Under the condition of
5 kV acceleration between Y2O3 and Si(100) is presented as Y2O3(110)/
/Si(100) and Y2O3[110]//Si[100] or Y2O3(110)//Si(100) and Y2O3[100]//S
i[100].