HETEROEPITAXIAL GROWTH OF Y2O3 FILMS ON SI(100) BY REACTIVE IONIZED CLUSTER BEAM DEPOSITION

Citation
Sc. Choi et al., HETEROEPITAXIAL GROWTH OF Y2O3 FILMS ON SI(100) BY REACTIVE IONIZED CLUSTER BEAM DEPOSITION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 170-174
Citations number
17
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
121
Issue
1-4
Year of publication
1997
Pages
170 - 174
Database
ISI
SICI code
0168-583X(1997)121:1-4<170:HGOYFO>2.0.ZU;2-Y
Abstract
Heteroepitaxial Y2O3 films on Si(100) have been grown by the technique of reactive ionized cluster beam (ICE) deposition. The composition of deposited film is investigated by using the X-ray photoelectron spect roscopy (XPS). It was found that the composition ratio of Y to O is 1 to 1.46. Using reflection high energy electron diffraction (RHEED) and glancing angle X-ray diffraction (GXRD), we study the crystallinity o f the films. It was noticed that the orientation of deposited film is mainly determined by the substrate temperature and the cluster acceler ation energy. We also found that, without acceleration below 800 degre es C, Y2O3 films were grown as polycrystalline. Under the condition of 5 kV acceleration between Y2O3 and Si(100) is presented as Y2O3(110)/ /Si(100) and Y2O3[110]//Si[100] or Y2O3(110)//Si(100) and Y2O3[100]//S i[100].