PULSED-LASER DEPOSITION OF CDWO4

Citation
K. Tanaka et al., PULSED-LASER DEPOSITION OF CDWO4, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 404-407
Citations number
4
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
121
Issue
1-4
Year of publication
1997
Pages
404 - 407
Database
ISI
SICI code
0168-583X(1997)121:1-4<404:PDOC>2.0.ZU;2-H
Abstract
Pulsed laser depositions of CdWO4 thin films are carried out in the pr esence of O-2 using targets of CdWO4(010) single crystals and pressed CdO and WO3 powder mixtures. CdWO4(002) peaks are observed on Si(111), CaF2(111), mica(001) and glass substrates by ablating CdWO4(010) sing le crystals. CdWO4(002) and (111) peaks are detected in the films prep ared on glass substrate using CdO and WO3 mixed powders and the relati ve XRD intensities change as a function of atomic ratio of CdO to WO3 used. The thin film with the stoichiometric composition of CdWO4 can b e prepared by selecting appropriate CdO/WO3 ratio in the mixed oxide t arget and the film shows a photoluminescence similar to CdWO4.