K. Tanaka et al., PULSED-LASER DEPOSITION OF CDWO4, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 404-407
Pulsed laser depositions of CdWO4 thin films are carried out in the pr
esence of O-2 using targets of CdWO4(010) single crystals and pressed
CdO and WO3 powder mixtures. CdWO4(002) peaks are observed on Si(111),
CaF2(111), mica(001) and glass substrates by ablating CdWO4(010) sing
le crystals. CdWO4(002) and (111) peaks are detected in the films prep
ared on glass substrate using CdO and WO3 mixed powders and the relati
ve XRD intensities change as a function of atomic ratio of CdO to WO3
used. The thin film with the stoichiometric composition of CdWO4 can b
e prepared by selecting appropriate CdO/WO3 ratio in the mixed oxide t
arget and the film shows a photoluminescence similar to CdWO4.