J. Beben et W. Gubernator, INVESTIGATION OF SURFACE-DIFFUSION OF HF ON W(100) BY THE DENSITY FLUCTUATION METHOD, Surface science, 304(1-2), 1994, pp. 59-64
Surface diffusion of hafnium deposited in ultrahigh vacuum onto a micr
ocrystal of tungsten was investigated using the field emission method
of density fluctuations. Surface diffusion coefficients were determine
d by analysis of the experimental time autocorrelation functions measu
red in the temperature range 370-470 K. Values of the activation energ
y for the surface diffusion of Hf on W, 0.53 and 0.54 eV were obtained
for two series of measurements performed under similar conditions of
deposition of Hf submonolayers.