PHASE-TRANSFORMATIONS AND COMPOUND FORMATION DURING ION IRRADIATION OF MATERIALS

Citation
Js. Williams et al., PHASE-TRANSFORMATIONS AND COMPOUND FORMATION DURING ION IRRADIATION OF MATERIALS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 84(2), 1994, pp. 199-203
Citations number
18
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
84
Issue
2
Year of publication
1994
Pages
199 - 203
Database
ISI
SICI code
0168-583X(1994)84:2<199:PACFDI>2.0.ZU;2-5
Abstract
This paper summarises new results which illustrate some important conc epts in phase transformation and compound formation under ion irradiat ion. Firstly, the amorphization behaviour in typical semiconductors an d metals is contrasted by examining different modes of nucleation of t he amorphous phase. Secondly, silicon dioxide formation within amorpho us silicon during low temperature, high dose oxygen bombardment is exa mined. Finally, we illustrate the formation of epitaxial Ni3Si on Ni(1 00) by high dose Si implantation and subsequent annealing.