Js. Williams et al., PHASE-TRANSFORMATIONS AND COMPOUND FORMATION DURING ION IRRADIATION OF MATERIALS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 84(2), 1994, pp. 199-203
This paper summarises new results which illustrate some important conc
epts in phase transformation and compound formation under ion irradiat
ion. Firstly, the amorphization behaviour in typical semiconductors an
d metals is contrasted by examining different modes of nucleation of t
he amorphous phase. Secondly, silicon dioxide formation within amorpho
us silicon during low temperature, high dose oxygen bombardment is exa
mined. Finally, we illustrate the formation of epitaxial Ni3Si on Ni(1
00) by high dose Si implantation and subsequent annealing.