CHARACTERIZATION OF YBA2CU3O7-X THIN-FILMS DEPOSITED BY HIGH-PRESSUREOXYGEN SPUTTERING

Authors
MURALIDHAR GK RAO GM MOHAN S KULKARNI VN BALASUBRAMANIAN TV
Citation
Gk. Muralidhar et al., CHARACTERIZATION OF YBA2CU3O7-X THIN-FILMS DEPOSITED BY HIGH-PRESSUREOXYGEN SPUTTERING, Solid state communications, 89(8), 1994, pp. 713-717
Citations number
17
Categorie Soggetti
Physics, Condensed Matter
Journal title
Solid state communications → ACNP
ISSN journal
00381098
Volume
89
Issue
8
Year of publication
1994
Pages
713 - 717
Database
ISI
SICI code
0038-1098(1994)89:8<713:COYTDB>2.0.ZU;2-G
Abstract
Superconducting YBa2Cu3O7 thin films have been deposited by high press ure oxygen sputtering technique (HOST). The epitaxial films prepared o n MgO substrates have been analysed using Rutherford Backscattering Sp ectroscopy (RBS) and Auger Electron Spectroscopy (AES). The films are found to be stoichiometric and homogeneous. Thickness uniformity and s urface roughness of these films have also been analysed. The possible sputter mechanism in this method has been discussed.