ACCURATE SIMULATION OF PATTERN TRANSFER PROCESSES USING MINKOWSKI OPERATIONS

A new method for simulation of etching and deposition processes has be en developed. This method is based on fundamental morphological operat ions derived from image and signal processing. As the material surface during simulation moves in time, the geometry either increases or dec reases. If the simulation geometry is considered as a two-valued image (material or vacuum), etching and deposition processes can be simulat ed by means of the erosion and dilation operation. Together with a cel lular material representation this method allows an accurate and stabl e simulation of three-dimensional arbitrary structures. Simulation res ults for several etching and deposition problems demonstrate accuracy and generality of our method.