T. Bever et al., ENHANCED COLLIMATION IN NARROW CHANNELS FABRICATED BY FOCUSED-ION-BEAM IMPLANTATION, Journal of applied physics, 75(5), 1994, pp. 2477-2480
We investigate the collimation factor of narrow channels defined by fo
cused-ion-beam insulation writing in the highly mobile two-dimensional
electron gas of an AlGaAs/GaAs heterostructure. We show that the degr
ee of collimation can be enhanced by appropriate channel design. Addit
ional boundary roughness caused by selective implantation of ions alon
g the channel boundary considerably increases the collimation.