DIRECT-CURRENT MAGNETRON-SPUTTERED IN2O3 FILMS AS TUNNEL BARRIERS

Citation
S. Kasiviswanathan et G. Rangarajan, DIRECT-CURRENT MAGNETRON-SPUTTERED IN2O3 FILMS AS TUNNEL BARRIERS, Journal of applied physics, 75(5), 1994, pp. 2572-2577
Citations number
59
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
75
Issue
5
Year of publication
1994
Pages
2572 - 2577
Database
ISI
SICI code
0021-8979(1994)75:5<2572:DMIFAT>2.0.ZU;2-4
Abstract
Insulating films of In2O3 were prepared by sputtering indium in the pr esence of pure oxygen using dc magnetron sputtering. Transmission elec tron microscopic investigations showed the films to be single phase an d polycrystalline. Analysis of the optical transmittance data showed t he films to have an optical band gap of 3.71 +/- 0.01 eV. Tunnel junct ions were made with high T(c) superconductors Bi2Sr2Ca1Cu2Oy and NdBa2 Cu3O7-delta using indium oxide as the barrier layer and Pb0.5In0.5 as the counter electrode. The conductance spectra displayed prominent str uctures attributable to energy gap. The reduced gap parameters for Bi2 Sr2Ca1Cu2Oy and NdBa2Cu3O7-delta were found to be 4.0 +/- 0.5 and 5.2 +/- 0.6, respectively.