PHOTOABLATION WITH THE FREE-ELECTRON LASER BETWEEN 2.7-MU-M AND 6.7-MU-M - THERMAL-DAMAGE

Authors
BENDE T MATALLANA M WALKER R JEAN B BRAU CA
Citation
T. Bende et al., PHOTOABLATION WITH THE FREE-ELECTRON LASER BETWEEN 2.7-MU-M AND 6.7-MU-M - THERMAL-DAMAGE, Investigative ophthalmology & visual science, 35(4), 1994, pp. 2155-2155
Citations number
NO
Categorie Soggetti
Ophthalmology
Journal title
Investigative ophthalmology & visual science → ACNP
ISSN journal
01460404
Volume
35
Issue
4
Year of publication
1994
Pages
2155 - 2155
Database
ISI
SICI code
0146-0404(1994)35:4<2155:PWTFLB>2.0.ZU;2-4