LOCAL PROBING OF ADSORBATE ELECTRONIC-STRUCTURE USING SOFT-X-RAY EMISSION - ATOMIC NITROGEN ON NI(100) AND CU(100)

Citation
T. Wiell et al., LOCAL PROBING OF ADSORBATE ELECTRONIC-STRUCTURE USING SOFT-X-RAY EMISSION - ATOMIC NITROGEN ON NI(100) AND CU(100), Surface science, 304(3), 1994, pp. 120000451-120000455
Citations number
22
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
304
Issue
3
Year of publication
1994
Pages
120000451 - 120000455
Database
ISI
SICI code
0039-6028(1994)304:3<120000451:LPOAEU>2.0.ZU;2-G
Abstract
The N 2p partial density of states of p4g-N/Ni(100) and c(2 x 2)-N/Cu( 100) overlayers have been studied by soft X-ray emission spectroscopy (SXES) and comparisons with corresponding UV photoelectron spectra are made. Broad states (approximately 10 eV) are observed due to the hybr idisation between the N 2p and the substrate 3d and 4sp bands. For bot h N/Cu and N/Ni the intensity stretches out to the Fermi level, where a prominent peak for N/Cu is observed. These states close to the Fermi level are interpreted as antibonding 2p-3d hybridised states. The hig her occupancy of these states in N/Cu is expected due to the higher bi nding energy of the 3d band in Cu than in Ni. For a complete interpret ation of the SXE spectra, especially for N/Cu where many features are observed, further theoretical studies are required.