K. Tomishige et al., IN-SITU EXAFS OBSERVATION OF THE MOLECULAR REACTION INTERMEDIATE FOR NO-H-2 REACTION ON HIGHLY-ACTIVE RH-SN SIO2 CATALYSTS/, Chemistry Letters, (2), 1994, pp. 235-238
In - situ EXAFS technique was successful by applied for the first time
to observe the molecular reaction intermediate for NO - H-2 reaction
on highly active Rh - Sn/SiO2 catalysts. The EXAFS data, with. the aid
of FTIR, revealed the existence the bent - type NO with the bond dist
ance of 0.256 nm with Sn atoms (Rh - NO - Sn) on the bimetallic surfac
e in the steady - state reaction conditions. The tilted NO was dissoci
ated to form Sn - O bond at 0.205 nm.