INFLUENCE OF SUBSTRATE ON STRUCTURAL-PROPERTIES OF TIO2 THIN-FILMS OBTAINED VIA MOCVD

Among the techniques developed for depositing thin films, metal-organi c chemical vapor deposition is one of the most promising. In the prese nt work, the deposition of TiO2 thin films on stainless steel, titaniu m, barium borosilicate glass and alumina substrates, using titanium te traisopropoxide as a precursor, was investigated. The films were depos ited at 420-degrees-C. The resulting film phase, checked by X-ray powd er diffraction, was found to be polycrystalline anatase and was orient ed with the a axis perpendicular to the substrate surface, except for alumina substrates where titania films were randomly oriented. Some co nsiderations on texture and crystallite size as a function of film thi ckness are reported. Annealing up to 1100-degrees-C induced the comple te anatase-rutile transformation on alumina substrates.