A 40 GHZ F(MAX) SI BIPOLAR TECHNOLOGY

Citation
H. Takemura et al., A 40 GHZ F(MAX) SI BIPOLAR TECHNOLOGY, NEC research & development, 35(1), 1994, pp. 23-29
Citations number
NO
Categorie Soggetti
Engineering, Eletrical & Electronic
Journal title
ISSN journal
0547051X
Volume
35
Issue
1
Year of publication
1994
Pages
23 - 29
Database
ISI
SICI code
0547-051X(1994)35:1<23:A4GFSB>2.0.ZU;2-3
Abstract
A Si bipolar transistor with maximum frequency of oscillation (f(max)) of 40 GHz has been developed. The high f(max) transistor is fabricate d by employing a process which makes it possible to independently opti mize the base resistance (r(b)) and the cut-off frequency (f(T)) using an A-BSA (Advanced BSG (Boro-Silicate Glass) Self-Aligned) transistor . The high f(max) transistors realize a 1/16 dynamic frequency divider operated up to 35 GHz and an ECL circuit whose delay time is 23 ps/ga te. These circuit performances depend on f(max) instead of f(T), stron gly.