A Si bipolar transistor with maximum frequency of oscillation (f(max))
of 40 GHz has been developed. The high f(max) transistor is fabricate
d by employing a process which makes it possible to independently opti
mize the base resistance (r(b)) and the cut-off frequency (f(T)) using
an A-BSA (Advanced BSG (Boro-Silicate Glass) Self-Aligned) transistor
. The high f(max) transistors realize a 1/16 dynamic frequency divider
operated up to 35 GHz and an ECL circuit whose delay time is 23 ps/ga
te. These circuit performances depend on f(max) instead of f(T), stron
gly.