PHOTOSENSITIVITY IN GE-DOPED SILICA OPTICAL WAVE-GUIDES AND FIBERS WITH 193-NM LIGHT FROM AN ARF EXCIMER-LASER

Authors
ALBERT J MALO B BILODEAU F JOHNSON DC HILL KO HIBINO Y KAWACHI M
Citation
J. Albert et al., PHOTOSENSITIVITY IN GE-DOPED SILICA OPTICAL WAVE-GUIDES AND FIBERS WITH 193-NM LIGHT FROM AN ARF EXCIMER-LASER, Optics letters, 19(6), 1994, pp. 387-389
Citations number
15
Categorie Soggetti
Optics
Journal title
Optics letters → ACNP
ISSN journal
01469592
Volume
19
Issue
6
Year of publication
1994
Pages
387 - 389
Database
ISI
SICI code
0146-9592(1994)19:6<387:PIGSOW>2.0.ZU;2-N
Abstract
Photosensitivity in optical fibers and waveguides has been associated with the bleaching of an absorption band located near 5.0 eV (or 242 r an). We present new results for Bragg grating formation and UV bleachi ng experiments carried out using 193-nm light from an ArF excimer lase r instead of the usual laser sources operating new 242 or 248 nm.