CHEMICAL-STABILITY OF LAMINATED ALN ALNH FILMS/

Citation
Xd. Wang et al., CHEMICAL-STABILITY OF LAMINATED ALN ALNH FILMS/, Thin solid films, 240(1-2), 1994, pp. 45-51
Citations number
18
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
240
Issue
1-2
Year of publication
1994
Pages
45 - 51
Database
ISI
SICI code
0040-6090(1994)240:1-2<45:COLAAF>2.0.ZU;2-Y
Abstract
Highly adherent and chemically stable coatings of aluminum nitride are produced by ion beam sputter deposition of graded concentration films of AlN:H(x), where x ranges to zero (AlN) at the outer surface of the film. These layered structures exhibit the good adhesion of AlN:H whi le maintaining the chemical stability of AlN. On the basis of scanning tunneling microscopy and scanning electron microscopy, films deposite d on room temperature substrates (metal or mica) form layers that are smooth (structures smaller than 6 nm) and that remain so for periods l onger than one month. Fourier transform spectroscopy indicates that th ey are chemically unchanged by exposure to air for two months.