Highly adherent and chemically stable coatings of aluminum nitride are
produced by ion beam sputter deposition of graded concentration films
of AlN:H(x), where x ranges to zero (AlN) at the outer surface of the
film. These layered structures exhibit the good adhesion of AlN:H whi
le maintaining the chemical stability of AlN. On the basis of scanning
tunneling microscopy and scanning electron microscopy, films deposite
d on room temperature substrates (metal or mica) form layers that are
smooth (structures smaller than 6 nm) and that remain so for periods l
onger than one month. Fourier transform spectroscopy indicates that th
ey are chemically unchanged by exposure to air for two months.