K. Kowal et al., IN-SITU ATOMIC-FORCE MICROSCOPY STUDY OF THE PLATING AND STRIPPING OFSILVER, Journal of the Electrochemical Society, 141(1), 1994, pp. 116-122
The morphology of silver deposited on a platinum electrode from aqueou
s solutions of H2SO4, Na2SO4, and Ag2SO4 was investigated for differen
t concentrations of silver ions and different potential sweep rates (1
, 4, and 10 mV/s) using in situ electrochemical atomic force microscop
y (ECAFM). At a sweep rate of 1 mV/s two kinds of silver crystals form
ed: smaller ones (distributed uniformly over the electrode surface) an
d larger ones (nucleated on scratches). At faster sweep rates the depo
sit becomes more uniform. The roughness of the silver deposit decrease
d and the deposit uniformity increased during extended cycling at a co
nstant sweep rate. Some artifacts due to the presence of the AFM tip w
ere observed when the force between the tip and the electrode surface
was large.