IN-SITU ATOMIC-FORCE MICROSCOPY STUDY OF THE PLATING AND STRIPPING OFSILVER

Citation
K. Kowal et al., IN-SITU ATOMIC-FORCE MICROSCOPY STUDY OF THE PLATING AND STRIPPING OFSILVER, Journal of the Electrochemical Society, 141(1), 1994, pp. 116-122
Citations number
25
Categorie Soggetti
Electrochemistry
ISSN journal
00134651
Volume
141
Issue
1
Year of publication
1994
Pages
116 - 122
Database
ISI
SICI code
0013-4651(1994)141:1<116:IAMSOT>2.0.ZU;2-V
Abstract
The morphology of silver deposited on a platinum electrode from aqueou s solutions of H2SO4, Na2SO4, and Ag2SO4 was investigated for differen t concentrations of silver ions and different potential sweep rates (1 , 4, and 10 mV/s) using in situ electrochemical atomic force microscop y (ECAFM). At a sweep rate of 1 mV/s two kinds of silver crystals form ed: smaller ones (distributed uniformly over the electrode surface) an d larger ones (nucleated on scratches). At faster sweep rates the depo sit becomes more uniform. The roughness of the silver deposit decrease d and the deposit uniformity increased during extended cycling at a co nstant sweep rate. Some artifacts due to the presence of the AFM tip w ere observed when the force between the tip and the electrode surface was large.