PROCESS AND FILM CHARACTERIZATION OF CHEMICAL-BATH-DEPOSITED ZNS THIN-FILMS

Authors
Citation
Jm. Dona et J. Herrero, PROCESS AND FILM CHARACTERIZATION OF CHEMICAL-BATH-DEPOSITED ZNS THIN-FILMS, Journal of the Electrochemical Society, 141(1), 1994, pp. 205-210
Citations number
26
Categorie Soggetti
Electrochemistry
ISSN journal
00134651
Volume
141
Issue
1
Year of publication
1994
Pages
205 - 210
Database
ISI
SICI code
0013-4651(1994)141:1<205:PAFCOC>2.0.ZU;2-M
Abstract
Chemical-bath deposition of ZnS thin films from NH3/NH2-NH2/SC(NH2)2/Z nSO4 solutions has been studied. The effect of various process paramet ers on the growth and the film quality is presented. A first approach to a mechanistic interpretation of the chemical process is reported. T he structural, optical, chemical, and electrical properties of the ZnS thin films deposited by this method have been studied. The electron d iffraction (EDS) analysis shows that the films are microcrystalline wi th a cubic structure. EDS analysis has demonstrated that the films are highly stoichiometric. Scanning electron microscopy studies of the Zn S thin films deposited by this method show that the films are continuo us and homogeneous. Electrical conductivity measurements have shown th e highly resistivity nature of these films (sigma = 10(-9) S cm-1).