Jm. Dona et J. Herrero, PROCESS AND FILM CHARACTERIZATION OF CHEMICAL-BATH-DEPOSITED ZNS THIN-FILMS, Journal of the Electrochemical Society, 141(1), 1994, pp. 205-210
Chemical-bath deposition of ZnS thin films from NH3/NH2-NH2/SC(NH2)2/Z
nSO4 solutions has been studied. The effect of various process paramet
ers on the growth and the film quality is presented. A first approach
to a mechanistic interpretation of the chemical process is reported. T
he structural, optical, chemical, and electrical properties of the ZnS
thin films deposited by this method have been studied. The electron d
iffraction (EDS) analysis shows that the films are microcrystalline wi
th a cubic structure. EDS analysis has demonstrated that the films are
highly stoichiometric. Scanning electron microscopy studies of the Zn
S thin films deposited by this method show that the films are continuo
us and homogeneous. Electrical conductivity measurements have shown th
e highly resistivity nature of these films (sigma = 10(-9) S cm-1).