RATIOS OF LEAF REFLECTANCES IN NARROW WAVEBANDS AS INDICATORS OF PLANT STRESS

Authors
Citation
Ga. Carter, RATIOS OF LEAF REFLECTANCES IN NARROW WAVEBANDS AS INDICATORS OF PLANT STRESS, International journal of remote sensing, 15(3), 1994, pp. 697-703
Citations number
15
Categorie Soggetti
Photographic Tecnology","Remote Sensing
ISSN journal
01431161
Volume
15
Issue
3
Year of publication
1994
Pages
697 - 703
Database
ISI
SICI code
0143-1161(1994)15:3<697:ROLRIN>2.0.ZU;2-8
Abstract
Ratios of leaf reflectances that were measured within narrow wavebands (2 nm) were evaluated as indicators of plant stress. Wavebands used i n ratio computation were based on earlier studies that determined the wavelength regions in which reflectance was most affected by 8 stress agents among 6 plant species. Several ratios, such as reflectance at 6 95 nm divided by reflectance at 670 nm (R695/R670), were affected by s ome but not all stress agents. However, R695/R420, R605/R760, R695/R76 0 and R710/R760 were significantly greater (p less-than-or-equal-to 0. 05) in stressed compared with non-stressed leaves for all stress agent s. The ratios that most strongly indicated plant stress were reflectan ce at 695 nm divided by reflectance at 420 nm or 760 nm.