Ga. Carter, RATIOS OF LEAF REFLECTANCES IN NARROW WAVEBANDS AS INDICATORS OF PLANT STRESS, International journal of remote sensing, 15(3), 1994, pp. 697-703
Ratios of leaf reflectances that were measured within narrow wavebands
(2 nm) were evaluated as indicators of plant stress. Wavebands used i
n ratio computation were based on earlier studies that determined the
wavelength regions in which reflectance was most affected by 8 stress
agents among 6 plant species. Several ratios, such as reflectance at 6
95 nm divided by reflectance at 670 nm (R695/R670), were affected by s
ome but not all stress agents. However, R695/R420, R605/R760, R695/R76
0 and R710/R760 were significantly greater (p less-than-or-equal-to 0.
05) in stressed compared with non-stressed leaves for all stress agent
s. The ratios that most strongly indicated plant stress were reflectan
ce at 695 nm divided by reflectance at 420 nm or 760 nm.