SUCCESSIVE DEVELOPMENT OPTIMIZATION OF RESIST KINOFORMS MANUFACTURED WITH DIRECT-WRITING, ELECTRON-BEAM LITHOGRAPHY

Authors
LARSSON M EKBERG M NIKOLAJEFF F HARD S
Citation
M. Larsson et al., SUCCESSIVE DEVELOPMENT OPTIMIZATION OF RESIST KINOFORMS MANUFACTURED WITH DIRECT-WRITING, ELECTRON-BEAM LITHOGRAPHY, Applied optics, 33(7), 1994, pp. 1176-1179
Citations number
5
Categorie Soggetti
Optics
Journal title
Applied optics → ACNP
ISSN journal
00036935
Volume
33
Issue
7
Year of publication
1994
Pages
1176 - 1179
Database
ISI
SICI code
0003-6935(1994)33:7<1176:SDOORK>2.0.ZU;2-M
Abstract
It is shown that multilevel SAL 110 resist kinoforms can be developed stepwise. Measurements of the kinoform diffraction pattern, performed between the development steps, permitted correct final developments to be made. No significant relief shape degradation was observed for dev elopment times as high as 25 min. The results imply that the electron- beam exposure doses, and hence the exposure time, can be reduced by a factor of 3 compared with doses used currently.